Manufacturing semiconductor device with film for forming protective layer

ABSTRACT

The present invention aims to provide a film for forming a protective layer that is capable of preventing cracks in a low dielectric material layer of a semiconductor wafer while suppressing an increase in the number of steps in the manufacture of a semiconductor device. This object is achieved by a film for forming a protective layer on a bumped wafer in which a low dielectric material layer is formed, including a support base, an adhesive layer, and a thermosetting resin layer, laminated in this order, wherein the melt viscosity of the thermosetting resin layer is 1×10 2  Pa·S or more and 2×10 4  Pa·S or less, and the shear modulus of the adhesive layer is 1×10 3  Pa or more and 2×10 6  Pa or less, when the thermosetting resin layer has a temperature in a range of 50 to 120° C.

CROSS REFERENCE TO RELATED APPLICATIONS

This application is a continuation of and claims priority to U.S. patentapplication Ser. No. 13/396,532, entitled Film for Forming ProtectiveLayer, filed Feb. 14, 2012, which claims priority to Japanese PatentApplication 2011-029879, filed Feb. 15, 2011. The entire disclosure ofthis application is hereby incorporated by reference for all purposes.

BACKGROUND OF THE INVENTION

1. Field of the Invention

The present invention relates to a film for forming a protective layerin which a support base, an adhesive layer, and a thermosetting resinlayer are laminated, in this order.

2. Description of Related Art

Conventionally, because the distance between circuits is becomingshorter as the circuit pattern formed on a semiconductor chip isbecoming finer, the capacitance between adjacent circuits is becominggreater. A phenomenon occurs according to which a signal traveling inthe circuit becomes slow (signal delay) in proportion to the increase incapacitance. It has been proposed to lower the capacitance betweencircuits by forming a low dielectric material layer on the circuit usinga material having a low dielectric constant, a so-called low-k material(low dielectric material).

Examples of the low dielectric material layer include a SiO₂ film(relative permittivity k=4.2), a SiOF film (k=3.5 to 3.7), and a SiOCfilm (k=2.5 to 2.8). Such a low dielectric material layer is formed on asemiconductor wafer by a plasma CVD method, for example.

However, such a low dielectric material layer is very brittle, and maycause cracks in a dicing step of the semiconductor process andoperational abnormality of the semiconductor element. A method ofremoving the low dielectric material layer first using a laser (laserscribing) and then dicing the material with a blade or the like has beenemployed recently (see Japanese Patent Application Laid-Open No.2010-093273, for example).

SUMMARY OF THE INVENTION

There has been a problem with dicing in that the number of stepsincreases in such a method because the laser scribing is performedfirst, followed by dicing with a blade or the like. Even when the laserscribing is used, the method has room for improvement in that it cannotsufficiently reduce the generation of cracks because the low dielectricmaterial layer is brittle.

The present invention has been made in view of the above-describedproblems, and an object thereof is to provide a film for forming aprotective layer that is capable of preventing cracks in a lowdielectric material layer while suppressing an increase in the number ofsteps of manufacture of a semiconductor device.

The present inventors made investigations to solve these problemsassociated with conventional approaches. As a result, they found thatcracks in the low dielectric material layer can be prevented whilesuppressing an increase in the number of steps of manufacture of asemiconductor device by using a film for forming a protective layer inwhich a support base, an adhesive layer, and a thermosetting resin layerare laminated, in this order, and in which the temperature at which themelt viscosity of the thermosetting resin layer falls within a specifiedrange, and the shear modulus of the adhesive layer falls within aspecified range, exists in a range of 50 to 120° C., in accordance withthe present invention.

The film for forming a protective layer according to the presentinvention is a film for forming a protective layer on a bumped wafer onwhich a low dielectric material layer is formed, including a supportbase, an adhesive layer, and a thermosetting resin layer, laminated inthis order, wherein the melt viscosity of the thermosetting resin layeris 1×10² Pa·S or more and 2×10⁴ Pa·S or less, and the shear modulus ofthe adhesive layer is 1×10³ Pa or more and 2×10⁶ Pa or less when thethermosetting resin layer has a temperature in a range of 50 to 120° C.

The film for forming a protective layer can be used in the followingmethod of manufacturing a semiconductor device, for example. A method ofmanufacturing a semiconductor device is disclosed, which includes thesteps of pasting a film for forming a protective layer onto a bumpedwafer in which a low dielectric material layer is formed with thethermosetting resin layer serving as a pasting surface; peeling thesupport base and the adhesive layer from the thermosetting resin layer;forming a protective layer by thermally curing the thermosetting resinlayer; and dicing the bumped wafer and the protective layer together.

In the film for forming a protective layer according to the presentinvention, the low dielectric material layer is reinforced by theprotective layer because the protective layer can be formed on the lowdielectric material layer of the bumped wafer. In addition, if thebumped wafer is diced together with the protective layer, because thelow dielectric material layer is diced while reinforced by theprotective layer, the generation of cracks in the low dielectricmaterial layer can be suppressed. Because the low dielectric materiallayer is diced while reinforced by the protective layer, the lowdielectric material layer does not have to be removed in advance bylaser scribing or the like. As a result, an increase in the number ofsteps can be suppressed.

Because the melt viscosity of the thermosetting resin layer is 1×10²Pa·S or more and 2×10⁴ Pa·S or less, and the shear modulus of theadhesive layer is 1×10³ Pa or more 2×10⁶ Pa or less when thethermosetting resin layer has a temperature in a range of 50 to 120° C.,the bump can be made to protrude from the thermosetting resin layer whenthe film for forming a protective layer is pasted onto the bumped waferat a temperature in this range. As a result, deterioration of connectionreliability can be suppressed.

Because the melt viscosity of the thermosetting resin layer is 1×10²Pa·S or more when the film for forming a protective layer is pasted ontothe bumped wafer at a temperature in the above-described range, thethermosetting resin layer can be prevented from being washed away whenthe film for forming a protective layer is pasted onto the bumped wafer,and the protective layer can be more certainly formed. Because the meltviscosity of the thermosetting resin layer is less than 2×10⁴ Pa·S whenthe film for forming a protective layer is pasted onto the bumped waferat a temperature in the above-described range, the bump can be made tomore certainly protrude from the thermosetting resin layer.

The thickness of the thermosetting resin layer is preferably 5 μm ormore and 200 μm or less. The bumped wafer normally has a height of thebump of 5 to 200 μm. By making the thickness of the thermosetting resinlayer 200 μm or less, the bump can be made to more certainly protrudefrom the thermosetting resin layer when the film for forming aprotective layer is pasted onto the bumped wafer. By making thethickness of the thermosetting resin layer 5 μm or more, cracks in thelow dielectric material layer during dicing can certainly be prevented.

In the above-described configuration, the thermosetting resin layerpreferably contains an epoxy resin and a phenol resin, and the adhesivelayer preferably contains an acrylic polymer. By making thethermosetting resin layer a layer containing an epoxy resin and a phenolresin as a base, and the adhesive layer a layer containing an acrylicpolymer as a base, the peeling property between the thermosetting resinlayer and the adhesive layer can be improved.

According to the present invention, a film for forming a protectivelayer can be provided that is capable of preventing cracks in a lowdielectric material layer while suppressing an increase in the number ofsteps of manufacture of a semiconductor device.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a sectional view schematically showing one example of the filmfor forming a protective layer according to the present embodiment;

FIG. 2 is a sectional view schematically showing one example of thebumped wafer;

FIG. 3 is a sectional view schematically showing one example of a methodof manufacturing a semiconductor device according to the presentembodiment;

FIG. 4 is a sectional view schematically showing one example of a methodof manufacturing a semiconductor device according to the presentembodiment;

FIG. 5 is a sectional view schematically showing one example of a methodof manufacturing a semiconductor device according to the presentembodiment; and

FIG. 6 is a sectional view schematically showing one example of a methodof manufacturing a semiconductor device according to the presentembodiment.

DESCRIPTION OF THE REFERENCE NUMERALS

-   2 SEMICONDUCTOR WAFER-   3 BUMPED WAFER-   5 SEMICONDUCTOR CHIP-   6 ADHEREND-   10 FILM FOR FORMING PROTECTIVE LAYER-   12 SUPPORT BASE-   14 ADHESIVE LAYER-   16 THERMOSETTING RESIN LAYER-   17 PROTECTIVE LAYER-   22 DICING BLADE-   41 LOW DIELECTRIC MATERIAL LAYER-   51 BUMP

DESCRIPTION OF THE PREFERRED EMBODIMENTS

An embodiment of the present invention is explained by referring to thedrawings. However, the present invention is not limited to theseexamples. Parts in the drawings that are not necessary for theexplanation are omitted, and there may be parts that are shown inmagnified or reduced scale to facilitate explanation. First, the filmfor forming a protective layer according to the present embodiment isexplained below. FIG. 1 is a sectional view schematically showing oneexample of the film for forming a protective layer according to thepresent embodiment. Film for forming protective layer

As shown in FIG. 1, a film 10 for forming a protective layer has aconfiguration in which a support base 12, an adhesive layer 14, and athermosetting resin layer 16 are laminated, in this order. The surfaceof the thermosetting resin layer 16 may be protected by a separator orthe like until it is pasted onto a wafer.

A bumped wafer, to which the film 10 for forming a protective layer ispasted, is explained. FIG. 2 is a sectional view schematically showingone example of the bumped wafer. As shown in FIG. 2, a bumped wafer 3has a semiconductor wafer 2 and bumps 51 formed on a circuit face sideof the semiconductor wafer 2. The bumped wafer 3 has a low dielectricmaterial layer 41 on the circuit face side of the semiconductor wafer 2.

The semiconductor wafer 2 is not especially limited as long as it is aknown or common semiconductor wafer, and can be appropriately selectedfrom semiconductor wafers of various types of materials. In the presentinvention, a silicon wafer can be suitably used as the semiconductorwafer. The thickness of the semiconductor wafer 2 is 10 to 800 μm forexample, and above all, a semiconductor wafer having a thickness of 20to 200 μm can be used. The height of the bump 51 is 5 to 200 μm forexample, and above all, the bump 51 having a height of to 100 μm can begenerally used.

The low dielectric material layer 41 can be formed by using a materialhaving a low dielectric constant, a so-called low-k material. Examplesthereof include a SiO₂ film (relative permittivity k=4.2), a SiOF film(k=3.5 to 3.7), and a SiOC film (k=2.5 to 2.8). The low dielectricmaterial layer 41 is formed on the semiconductor wafer 2 by a plasma CVDmethod or the like.

In the film 10 for forming a protective layer (refer to FIG. 1), themelt viscosity of the thermosetting resin layer 16 is 1×10² Pa·S or moreand 2×10⁴ Pa·S or less, and the shear modulus of the adhesive layer 14is 1×10³ Pa or more and 2×10⁶ Pa or less when the thermosetting resinlayer has a temperature in a range of 50 to 120° C. In the film 10 forforming a protective layer (refer to FIG. 1), it is more preferable thatthe melt viscosity of the thermosetting resin layer 16 is 1×10³ Pa·S ormore and 1×10⁴ Pa·S or less, and the shear modulus of the adhesive layer14 is 1×10⁴ or more and 2×10⁶ Pa or less when the thermosetting resinlayer has a temperature in a range of 50 to 120° C. Because the meltviscosity of the thermosetting resin layer 16 is 1×10² Pa·S or more and2×10⁴ Pa·S or less, and the shear modulus of the adhesive layer 14 is1×10³ Pa or more and 2×10⁶ Pa or less when the thermosetting resin layerhas a temperature in a range of 50 to 120° C., the bump can be made toprotrude from the thermosetting resin layer 16 when the film 10 forforming a protective layer is pasted onto the bumped wafer 3. As aresult, deterioration of the connection reliability can be suppressed.The melt viscosity of the thermosetting resin layer 16 can be controlledby the ratio of the thermosetting resin to be added, for example. Themelt viscosity of the thermosetting resin layer 16 is 1×10² Pa·S or moreand 2×10⁴ Pa·S or less, and the shear modulus of the adhesive layer 14is 1×10³ Pa or more and 2×10⁶ Pa or less when the thermosetting resinlayer has a temperature more preferably in a range of 50 to 100° C. andfurther more preferably in a range of 60 to 90° C.

Because the melt viscosity of the thermosetting resin layer 16 is 1×10²Pa·S or more in the above-described temperature range when the film 10for forming a protective layer is pasted onto the bumped wafer 3 in thistemperature range, the thermosetting resin layer 16 can be preventedfrom being washed away when the film 10 for forming a protective layeris pasted onto the bumped wafer 3, and a protective layer 17 can becertainly formed. Because the melt viscosity of the thermosetting resinlayer 16 is less than 2×10⁴ Pa·S in the above-described temperaturerange when the film 10 for forming a protective layer is pasted onto thebumped wafer 3 in this temperature range, the bump can be made to morecertainly protrude from the thermosetting resin layer 16.

The melt viscosity of the thermosetting resin layer is a value measuredby a parallel plate method using a rheometer (RS-1 manufactured by HaakeGmbH). More in detail, it is a value obtained by performing themeasurement under a condition of a gap of 100 μm, a rotating conediameter of 20 mm, and a rotational speed of 10 s⁻¹, at a temperature inthe range of room temperature to 250° C.

Thermosetting Resin Layer

The thermosetting resin layer 16 is pasted onto the surface where thebumps 51 of the bumped wafer 3 are formed, and is used to hold and fixthe bumped wafer 3 when the backside of the bumped wafer 3 is ground.The thermosetting resin layer 16 is thermally cured after being pastedonto the bumped wafer 3 to form the protective layer 17. The protectivelayer 17 has a function of protecting the low dielectric material layer41 when the bumped wafer 3 is diced.

The thermosetting resin layer 16 has a film form. The thermosettingresin layer 16 is normally in an uncured state (including a semi-curedstate) when it is in a form of the film 10 for forming a protectivelayer as a product, and is thermally cured after being pasted onto thebumped wafer 3 (see FIG. 2) (details are described later).

The thermosetting resin layer 16 can be constituted as a resincomposition containing at least a thermosetting resin. The resincomposition may contain a thermoplastic resin.

Examples of the thermosetting resin include an epoxy resin, a phenolresin, an amino resin, an unsaturated polyester resin, a polyurethaneresin, a silicone resin, and a thermosetting polyimide resin. Thethermosetting resins can be used alone, or two types or more can be usedtogether. An epoxy resin having a small amount of ionic impurities thaterode the semiconductor element is especially suitable as thethermosetting resin. Further, a phenol resin can be suitably used as acuring agent for the epoxy resin. When the thermosetting resin layer 16is constituted by including an epoxy resin and a phenol resin, it ispreferable to include an acrylic polymer in the adhesive layer 14. Thisis because the peeling property between the thermosetting resin layer 16and the adhesive layer 14 can be improved.

The epoxy resin is not especially limited, and examples thereof includebifunctional epoxy resins and polyfunctional epoxy resins such as abisphenol A type epoxy resin, a bisphenol F type epoxy resin, abisphenol S type epoxy resin, a brominated bisphenol A type epoxy resin,a hydrogenated bisphenol A type epoxy resin, a bisphenol AF type epoxyresin, a biphenyl type epoxy resin, a naphthalene type epoxy resin, afluorene type epoxy resin, a phenol novolac type epoxy resin, anortho-cresol novolac type epoxy resin, a trishydroxyphenylmethane typeepoxy resin, and a tetraphenylolethane type epoxy resin, a hydantointype epoxy resin, a trisglycidylisocyanurate type epoxy resin, and aglycidylamine type epoxy resin.

As the epoxy resin, a naphthalene type epoxy resin and atrishydroxyphenylmethane type epoxy resin are especially preferableamong the examples described above. These epoxy resins can be suitablyused to achieve the desired heat resistance during reflow.

The epoxy equivalent of the epoxy resin is preferably 150 to 1000 g/eq,and more preferably 150 to 400 g/eq. By making the epoxy equivalent ofthe epoxy resin 150 to 400 g/eq, heat resistance can be improved more.

The phenol resin acts as a curing agent for the epoxy resin, andexamples thereof include novolac type phenol resins such as a phenolnovolac resin, a phenol aralkyl resin, a cresol novolac resin, atert-butylphenol novolac resin, and a nonylphenol novolac resin, a resoltype phenol resin, and polyoxystyrenes such as polyparaoxystyrene. Thephenol resins can be used alone or two types or more can be usedtogether. Among these phenol resins, a phenol novolac resin, a cresolnovolac resin, and a phenolaralkyl resin can be preferably used toachieve the desired heat resistance.

The phenol equivalent of the phenol resin is preferably 90 to 300 g/eq,more preferably 100 to 270 g/eq, and further preferably 150 to 250 g/eqto achieve the desired heat resistance and the stress relaxationproperty at a high temperature.

The phenol resin is suitably compounded in the epoxy resin so that ahydroxyl group in the phenol resin to 1 equivalent of an epoxy group inthe epoxy resin component becomes 0.5 to 2.0 equivalents. The ratio ismore preferably 0.8 to 1.2 equivalents. When the compounding ratio goesout of this range, sufficient curing reaction does not proceed, and thecharacteristics of the epoxy resin cured substance easily deteriorate.

A thermal curing accelerating catalyst for an epoxy resin and a phenolresin may be used in the present invention. The thermal curingaccelerating catalyst is not especially limited, and the catalyst can beappropriately selected from known thermal curing accelerating catalysts.The thermal curing accelerating catalysts can be used alone, or two ormore types can be used together. Examples of the thermal curingaccelerating catalyst include an amine curing accelerator, a phosphoruscuring accelerator, an imidazole curing accelerator, a boron curingaccelerator and a phosphorus-boron curing accelerator.

The amine curing accelerator is not especially limited, and examplesthereof include monoethanolamine trifluoroborate manufactured by StellaChemifa and dicyandiamide manufactured by Nacalai Tesque.

The phosphorus curing accelerator is not especially limited, andexamples thereof include triorganophosphines such as triphenylphosphine,tributylphosphine, tri(p-methylphenyl)phosphine,tri(nonylphenyl)phosphine, and diphenyltriphosphine, tetraphenylphosphonium bromide (trade name TPP-PB), methyltriphenylphosphonium(trade name TPP-MB), methyltriphosphonium chloride (trade name TPP-MC),methoxymethyltriphenylphosphonium (trade name TPP-MOC), andbenzyltriphenylphosphonium chloride (trade name TPP-ZC) (all aremanufactured by Hokko Chemical Industry Co., Ltd.). A triphenylphosphinecompound substantially showing insolubility in the epoxy resin ispreferable. When the triphenylphosphine compound is insoluble in theepoxy resin, excessive thermal curing can be suppressed. Examples of athermosetting catalyst having substantial insolubility in the epoxyresin include methyltriphenylphosphonium (trade name TPP-MB). Here,“insolubility” designates that the thermosetting catalyst made of thetriphenylphosphine compound is insoluble in a solvent made of an epoxyresin; and in more detail, it designates that the thermoset catalystdoes not dissolve in an amount of 10% by weight or more in a temperaturerange of 10 to 40° C.

Examples of the imidazole curing accelerator include 2-methylimidazole(trade name 2MZ), 2-undecylimidazole (trade name C11-Z),2-heptadecylimidazole (trade name C17Z), 1,2-dimethylimidazole (tradename 1.2DMZ), 2-ethyl-4-methylimidazole (trade name 2E4MZ),2-phenylimidazole (trade name 2PZ), 2-phenyl-4-methylimidazole (tradename 2P4MZ), 1-benzyl-2-methylimidazole (trade name IB2MZ),1-benzyl-2-phenylimidazole (trade name IB2PZ),1-cyanoethyl-2-methylimidazole (trade name 2MZ-CN),1-cyanoethyl-2-undecylimidazole (trade name C11Z-CN),1-cyanoethyl-2-phenylimidazolium trimellitate (trade name 2PZCNS-PW),2,4-diamino-6-[2′-methylimidazolyl-(1′)]-ethyl-s-triazine (trade name2MZ-A), 2,4-diamino-6-[2′-undecylimidazolyl-(1′)]-ethyl-s-triazine(trade name C11Z-A),2,4-diamino-6-[‘-ethyl-4’-methylimidazolyl-(1′)]-ethyl-s-triazine (tradename 2E4MZ-A), 2,4-diamino-6-[2′-methylimidazolyl-(1′)]-ethyl-s-triazineisocyanuric acid adduct (trade name 2MA-OK),2-phenyl-4,5-dihydroxymethylimidazole (trade name 2PHZ-PW), and2-phenyl-4-methyl-5-dihydroxymethylimidazole (trade name 2P4 MHZ-PW)(all are manufactured by Shikoku Chemicals Corporation).

The boron curing accelerator is not especially limited, and examplesthereof include trichloroborane.

The phosphorous-boron curing accelerator is not especially limited, andexamples thereof include tetraphenylphosphonium tetraphenylborate (tradename TPP-K), tetraphenylphosphonium tetra-p-triborate (trade nameTPP-MK), benzyltriphenylphosphonium tetraphenylborate (trade nameTPP-ZK), and triphenylphosphine triphenylborane (trade name TPP-S) (allare manufactured by Hokko Chemical Industry, Co., Ltd.).

The ratio of the thermal curing-accelerating catalyst is preferably0.01% by weight or more and 10% by weight or less, of the total amountof the thermosetting resin. By making the ratio of the thermalcuring-accelerating catalyst 0.01% by weight or more, sufficient curingcan be achieved. By making the ratio of the thermal curing-acceleratingcatalyst 10% by weight or less, the manufacturing cost can be reduced.The ratio of the thermal curing-accelerating catalyst is more preferably0.1% by weight or more and 5% by weight or less, and further preferably0.3% by weight or more and 3% by weight or less, of the total amount ofthe thermosetting resin.

The thermosetting resin layer 16 may be crosslinked to a certain levelin advance to improve the adhesion characteristics to the bumped wafer 3under a high temperature and to improve heat resistance. Thethermosetting resin layer 16 can be crosslinked by adding, as acrosslinking agent, a polyfunctional compound that reacts with afunctional group or the like at the end of the molecular chain of thepolymer during manufacture.

The crosslinking agent is not especially limited, and a knowncrosslinking agent can be used. Specific examples thereof include anisocyanate crosslinking agent, an epoxy crosslinking agent, a melaminecrosslinking agent, a peroxide crosslinking agent, a urea crosslinkingagent, a metal alkoxide crosslinking agent, a metal chelate crosslinkingagent, a metal salt crosslinking agent, a carbodiimide crosslinkingagent, an oxazoline crosslinking agent, an aziridine crosslinking agent,and an amine crosslinking agent. An isocyanate crosslinking agent and anepoxy crosslinking agent are preferable. The crosslinking agents can beused alone or two type or more can be used together.

Examples of the isocyanate crosslinking agent include lower aliphaticpolyisocyanates such as 1,2-ethylene diisocyanate, 1,4-butyleneisocyanate, and 1,6-hexamethylene diisocyanate; alicyclicpolyisocyanates such as cyclopentylene diisocyanate, cyclohexylenediisocyanate, isophorone diisocyanate, hydrogenated tolylenediisocyanate, and hydrogenated xylene diisocyanate; and aromaticpolyisocyanates such as 2,4-tolylene diisocyanate, 2,6-tolylenediisocyanate, 4,4′-diphenylmethane diisocyanate, and xylylenediisiocyanate. A trimethylolpropane/tolylene diisocyanate trimer adduct(tradename: Coronate L manufactured by Nippon Polyurethane Industry Co.,Ltd.) and a trimethylolpropane/hexamethylene diisocyanate trimer adduct(tradename: Coronate HL manufactured by Nippon Polyurethane IndustryCo., Ltd.) can also be used. Examples of the epoxy crosslinking agentinclude N,N,N′,N′-tetraglycidyl-m-xylenediamine, diglycidylaniline,1,3-bis(N,N-glycidylaminomethyl)cyclohexane, 1,6-hexanedioldiglycidylether, neopentylglycol diglycidylether, ethyleneglycoldiglycidylether, propyleneglycol diglycidylether, polyethyleneglycoldiglycidylether, polypropyleneglycol diglycidylether, sorbitolpolyglycidylether, glycerol polyglycidylether, pentaerythritolpolyglycidylether, polyglycerol polyglycidylether, sorbitanpolyglycidylether, trimethylolpropane polyglycidylether, diglycidyladipate, diglycidyl o-phthalate,triglycidyl-tris(2-hydroxyethyl)isocyanurate, resorcin diglycidylether,bisphenol-s-diglycidyl ether, and an epoxy resin having two or moreepoxy groups in the molecule.

The amount of the crosslinking agent used is not especially limited, andcan be appropriately selected according to the level of crosslinking.Specifically, the amount of the crosslinking agent used is normallypreferably 7 parts by weight or less (0.05 to 7 parts by weight, forexample) per 100 parts by weight of a polymer component (especially, apolymer having a functional group at the end of the molecular chain) forexample. By making the amount of the crosslinking agent used 7 parts byweight or less per 100 parts by weight of the polymer component, adecrease in adhesive strength can be suppressed. To improve cohesivestrength, the amount of the crosslinking agent used is preferably 0.05parts by weight or more to 100 parts by weight of the polymer component.

In the present invention, it is possible to perform a crosslinkingtreatment by irradiation with an electron beam, an ultraviolet ray, orthe like in place of using the crosslinking agent or together with thecrosslinking agent.

Examples of the thermoplastic resin include a natural rubber, a butylrubber, an isoprene rubber, a chloroprene rubber, an ethylene-vinylacetate copolymer, an ethylene-acrylate copolymer, an ethylene-acrylicester copolymer, a polybutadiene resin, a polycarbonate resin, athermoplastic polyimide resin, polyamide resins such as 6-nylon and6,6-nylon, a phenoxy resin, an acrylic resin, saturated polyester resinssuch as PET (polyethylene terephthalate) and PBT (polybutyleneterephthalate), a polyamideimide resin, and a fluororesin. Thethermoplastic resins can be used alone or two types or more can be usedtogether. Of these thermoplastic resins, acrylic resin is particularlypreferable since the resin contains ionic impurities in only a smallamount and has a high heat resistance so as to make it possible toensure the reliability of the semiconductor element.

The acrylic resin is not especially limited, and examples thereofinclude a polymer having one type or two types or more of acrylates ormethacrylates having a linear or branched alkyl group having 30 or lesscarbon atoms (preferably 4 to 18 carbon atoms, further preferably 6 to10 carbon atoms, and especially preferably 8 or 9 carbon atoms) as acomponent. That is, the acrylic resin of the present invention has abroad meaning and also includes a methacrylic resin. Examples of thealkyl group include a methyl group, an ethyl group, a propyl group, anisopropyl group, an n-butyl group, a t-butyl group, an isobutyl group, apentyl group, an isopentyl group, a hexyl group, a heptyl group, a2-ethylhexyl group, an octyl group, an isooctyl group, a nonyl group, anisononyl group, a decyl group, an isodecyl group, an undecyl group, adodecyl group (a lauryl group), a tridecyl group, a tetradecyl group, astearyl group, and an octadecyl group.

Other monomers that can form the above-described acrylic resin (monomersother than an alkylester of acrylic acid or methacrylic acid having analkyl group having 30 or less carbon atoms) are not especially limited.Examples thereof include carboxyl-containing monomers such as acrylicacid, methacrylic acid, carboxyethyl acrylate, carboxypentyl acrylate,itaconic acid, maleic acid, fumaric acid, and crotonic acid; acidanhydride monomers such as maleic anhydride and itaconic anhydride;hydroxyl-containing monomers such as 2-hydroxyethyl (meth)acrylate,2-hydroxypropyl (meth)acrylate, 4-hydroxybutyl (meth)acrylate,6-hydroxyhexyl (meth)acrylate, 8-hydroxyoctyl (meth)acrylate,10-hydroxydecyl (meth)acrylate, 12-hydroxylauryl (meth)acrylate, and(4-hydroxymethylcyclohexyl)methylacrylate; monomers which contain asulfonic acid group, such as styrenesulfonic acid, allylsulfonic acid,2-(meth)acrylamide-2-methylpropanesulfonic acid, (meth)acrylamidepropanesulfonic acid, sulfopropyl (meth)acrylate, and(meth)acryloyloxynaphthalenesulfonic acid; and monomers which contain aphosphoric acid group, such as 2-hydroxyethylacryloyl phosphate. Amongthese, a carboxyl group-containing monomer is preferable in that thepreferred value for the tensile storage modulus, Ea, of the die bondfilm can be achieved. (Meth)acrylate refers to an acrylate and/or amethacrylate, and hereinafter, every occurrence of (meth) in the presentapplication has the same meaning.

Other additives can be appropriately compounded in the thermosettingresin layer 16 as necessary. Examples of the other additives include afiller, a flame retardant, a silane coupling agent, an ion trappingagent, an extender, an anti-aging agent, an antioxidant, and asurfactant.

The filler may be any of an inorganic filler and an organic filler.However, an inorganic filler is preferable. By compounding a filler suchas an inorganic filler, resistance to thermal stress can be improved.Examples of the inorganic filler include ceramics such as silica, clay,gypsum, calcium carbonate, barium sulfate, aluminum oxide, berylliumoxide, silicon carbide, and silicon nitride, metals such as aluminum,copper, silver, gold, nickel, chromium, lead, tin, zinc, palladium, andsolder, alloys, and various inorganic powders consisting of carbon. Thefillers may be used alone or two types or more can be used together.Among these, silica, especially molten silica is preferable. The averageparticle size of the inorganic filler is preferably in a range of 0.1 to80 μm. The average particle size of the inorganic filler can be measuredwith a laser diffraction type particle size distribution device, forexample.

The compounding amount of the filler (especially, the inorganic filler)is preferably 80 parts by weight or less (0 to 80 parts by weight), andespecially preferably 0 to 70 parts by weight to 100 parts by weight ofthe organic resin component.

Examples of the flame retardant include antimony trioxide, antimonypentoxide, and a brominated epoxy resin. These can be used alone or twotypes or more can be used together. Examples of the silane couplingagent include β-(3,4-epoxycyclohexyl)ethyltrimethoxysilane,γ-glycidoxypropyltrimethoxysilane, andγ-glycidoxypropylmethyldiethoxysilane. These compounds can be used aloneor two types or more can be used together. Examples of the ion trappingagent include hydrotalcites and bismuth hydroxide. These can be usedalone or two types or more can be used together.

The thermosetting resin layer 16 can be formed by a common method ofpreparing a resin composition by mixing a thermosetting resin such as anepoxy resin, a thermoplastic resin such as an acrylic resin asnecessary, and a solvent and other additives as necessary and formingthe resin composition into a film-like layer. Specifically, thefilm-shaped thermosetting resin layer 16 can be formed by a method ofapplying the resin composition onto the adhesive layer 14 or a method offorming a resin layer by applying the resin composition onto anappropriate separator such as release paper and transferring(transferring by adhesion) the resin layer onto the adhesive layer 14,for example. The resin composition may be a solution or a dispersionliquid.

In the present invention, because the thermosetting resin layer is afilm-shaped product formed from a resin composition containing athermosetting resin, adhesion to the bumped wafer 3 can be effectivelyexhibited.

The thickness of the thermosetting resin layer 16 (the total thicknessin the case of a laminated film) through which the bumps 51 can protrudeis sufficient when the thermosetting resin layer 16 is pasted onto thebumped wafer 3, and is preferably 2 to 200 μm, more preferably 2 to 100μm, and further preferably 5 to 50 μm.

The thickness of the thermosetting resin layer 16 is preferably 0.05 to0.9 times, and more preferably 0.05 to 0.7 times the height of the bump51. When the thickness of the thermosetting resin layer 16 is 0.05 to0.9 times the height of the bump 51, the bumps 51 can be made to morecertainly protrude from the thermosetting resin layer 16 when the film10 for forming a protective layer is pasted onto the bumped wafer 3.

The surface of the thermosetting resin layer 16 is preferably protectedby a separator (release liner) (not shown in the drawings). Theseparator has a function as a protective material to protect thethermosetting resin layer 16 until it is put to practical use. Theseparator can be used as a support base when the thermosetting resinlayer 16 is transferred onto the adhesive layer 14. The separator ispeeled when the bumped wafer 3 is pasted onto the film 10 for forming aprotective layer. Examples of the separator include polyethylene,polypropylene, plastic films such as polyethylene terephthalate whosesurface is coated with a remover such as a fluorine remover or a longchain alkylacrylate remover, and paper. The separator can be formed by aconventionally known method. The thickness and the like of the separatorare not especially limited.

Adhesive Layer

The adhesive used to form the adhesive layer 14 is not especiallylimited, and a general pressure-sensitive adhesive such as an acrylicpressure-sensitive adhesive or a rubber pressure-sensitive adhesive canbe used, for example. The pressure-sensitive adhesive is preferably anacrylic pressure-sensitive adhesive containing an acrylic polymer as abase polymer in view of clean washing of electronic components such as asemiconductor wafer and glass, which are easily damaged bycontamination, with ultrapure water or an organic solvent such asalcohol.

Specific examples of the acryl polymers include an acryl polymer inwhich acrylate is used as a main monomer component. Examples of theacrylate include alkyl acrylate (for example, a straight chain orbranched chain alkyl ester having 1 to 30 carbon atoms, and particularly4 to 18 carbon atoms in the alkyl group such as methylester, ethylester,propylester, isopropylester, butylester, isobutylester, sec-butylester,t-butylester, pentylester, isopentylester, hexylester, heptylester,octylester, 2-ethylhexylester, isooctylester, nonylester, decylester,isodecylester, undecylester, dodecylester, tridecylester,tetradecylester, hexadecylester, octadecylester, and eicosylester) andcycloalkyl acrylate (for example, cyclopentylester, cyclohexylester,etc.). These monomers may be used alone, or two or more types may beused in combination. The acrylic polymer may optionally contain a unitcorresponding to a different monomer component copolymerizable with theabove-mentioned alkyl ester of (meth)acrylic acid or cycloalkyl esterthereof in order to improve the cohesive force, heat resistance or someother property of the polymer. Examples of such a monomer componentinclude carboxyl-containing monomers such as acrylic acid, methacrylicacid, carboxyethyl (meth)acrylate, carboxypentyl (meth)acrylate,itaconic acid, maleic acid, fumaric acid, and crotonic acid; acidanhydride monomers such as maleic anhydride, and itaconic anhydride;hydroxyl-containing monomers such as 2-hydroxyethyl (meth)acrylate,2-hydroxypropyl (meth)acrylate, 4-hydroxybutyl (meth)acrylate,6-hydroxyhexyl (meth)acrylate, 8-hydroxyoctyl (meth)acrylate,10-hydroxydecyl (meth)acrylate, 12-hydroxylauryl (meth)acrylate, and(4-hydroxymethylcyclohexyl)methyl (meth)acrylate; sulfonic acid groupcontaining monomers such as styrenesulfonic acid, allylsulfonic acid,2-(meth)acrylamide-2-methylpropanesulfonic acid,(meth)acrylamidepropanesulfonic acid, sulfopropyl (meth)acrylate, and(meth)acryloyloxynaphthalenesulfonic acid; phosphoric acid groupcontaining monomers such as 2-hydroxyethylacryloyl phosphate;acrylamide; and acrylonitrile. These copolymerizable monomer componentsmay be used alone or in a combination of two or more thereof. The amountof the copolymerizable monomer(s) to be used is preferably 40% or lessby weight of all the monomer components.

For crosslinking, the acrylic polymer can also contain multifunctionalmonomers if necessary as the copolymerizable monomer component. Suchmultifunctional monomers include hexanediol di(meth)acrylate,(poly)ethylene glycol di(meth)acrylate, (poly)propylene glycoldi(meth)acrylate, neopentyl glycol di(meth)acrylate, pentaerythritoldi(meth)acrylate, trimethylol propane tri(meth)acrylate, pentaerythritoltri(meth)acrylate, dipentaerythritol hexa(meth)acrylate, epoxy(meth)acrylate, polyester (meth)acrylate, urethane (meth)acrylate etc.These multifunctional monomers can also be used as a mixture of one ormore thereof. For the desired adhesiveness, etc., the amount of themultifunctional monomer is preferably 30 wt % or less based on the totalmonomer content.

Preparation of the above acryl polymer can be performed in anappropriate manner such as solution polymerization, emulsionpolymerization, bulk polymerization, and suspension polymerization of amixture of one or two or more kinds of component monomers, for example.Since the adhesive layer preferably has a composition in which thecontent of low molecular weight materials is suppressed for preventingwafer contamination, and since the adhesive layer, in which an acrylpolymer having a weight-average molecular weight of 300000 or more,particularly 400000 to 1500000 is a main component, is preferable forpreventing wafer contamination, the adhesive can be made to have anappropriate cross-linking manner such as an internal cross-linkingmanner, an external cross-linking manner, etc.

To increase the number-average molecular weight of the base polymer,such as an acrylic polymer etc., an external crosslinking agent can besuitably adopted in the adhesive. The external crosslinking method isspecifically a reaction method that involves adding and reacting acrosslinking agent such as a polyisocyanate compound, epoxy compound,aziridine compound, melamine crosslinking agent, urea resin, anhydrouscompound, polyamine, or carboxyl group-containing polymer. When theexternal crosslinking agent is used, the amount of the crosslinkingagent to be used is determined according to the base polymer to becrosslinked and applications thereof as the adhesive. Generally, thecrosslinking agent is preferably incorporated in an amount of about 5parts by weight or less based on 100 parts by weight of the basepolymer. The lower limit of the crosslinking agent is preferably 0.1parts by weight or more. The adhesive may be blended not only with thecomponents described above, but also with a wide variety ofconventionally known additives such as a tackifier, and an aginginhibitor, if necessary.

The adhesive layer 14 can be formed with an ultraviolet-ray curableadhesive. The adhesive power of the ultraviolet-ray curable adhesive canbe easily decreased by increasing the degree of crosslinking throughirradiation with an ultraviolet ray. Therefore, when the adhesive layer14 is formed with an ultraviolet-ray curable adhesive, the support base12 and the adhesive layer 14 can be peeled from the thermosetting resinlayer 16 by decreasing the adhesive strength through irradiation with anultraviolet ray after the film 10 for forming a protective layer ispasted onto the bumped wafer 3.

The irradiation with an ultraviolet ray is preferably performed at anultraviolet-ray intensity of 10 to 1000 ml/cm² and it is more preferablyperformed at 100 to 500 mJ/cm². By making the ultraviolet-ray intensity10 mJ/cm² or more, the adhesive layer 14 can be cured sufficiently, andexcess adhesion with the thermosetting resin layer 16 can be prevented.As a result, the adhesive layer 14 can be favorably peeled from thethermosetting resin layer 16 at the interface therebetween, and adhesiveresidue attached to the thermosetting resin layer 16 from the adhesivelayer 14 can be prevented. On the other hand, by making theultraviolet-ray intensity 1000 mJ/cm² or less, deterioration of the filmdue to the generation of heat can be suppressed.

An ultraviolet-ray curable adhesive having an ultraviolet-ray curablefunctional group such as a carbon-carbon double bond and exhibitingadhesion can be used without special limitation. An example of theultraviolet-ray curable adhesive is an addition-type ultraviolet-raycurable adhesive in which ultraviolet-ray curable monomer components andoligomer components are compounded in a general pressure-sensitiveadhesive such as the acrylic pressure-sensitive adhesive or the rubberpressure-sensitive adhesive.

Examples of the ultraviolet-ray curable monomer component to becompounded include a urethane oligomer, urethane(meth)acrylate,trimethylolpropane tri(meth)acrylate, tetramethylolmethanetetra(meth)acrylate, pentaerythritol tri(meth)acrylate, pentaerythritoltetra(meth)acrylate, dipentaerythritol monohydroxypenta(meth)acrylate,dipentaerythritol hexa(meth)acrylate, and 1,4-butanedioldi(meth)acrylate. Further, the ultraviolet curable oligomercomponent includes various types of oligomers such as urethane-based,polyether-based, polyester-based, polycarbonate-based, andpolybutadiene-based oligomers, and its molecular weight is appropriatelyin a range of about 100 to 30,000. Among these, urethane (meth)acrylateis preferably compounded to enhance the tip protruding property of thebump. The compounding amount of the ultraviolet-ray curable monomercomponent and the oligomer component can be appropriately determined toan amount in which the adhesive strength of the adhesive layer can bedecreased depending on the type of the adhesive layer. Generally, it isfor example 5 to 500 parts by weight, and preferably about 40 to 150parts by weight based on 100 parts by weight of the base polymer such asan acryl polymer constituting the adhesive.

Further, besides the added type ultraviolet curable adhesive describedabove, the ultraviolet curable adhesive includes aninternally-crosslinked ultraviolet curable adhesive using an acrylpolymer having a radical reactive carbon-carbon double bond in thepolymer side chain, in the main chain, or at the end of the main chainas the base polymer. The internally-crosslinked ultraviolet curableadhesives are preferable because they do not require an oligomercomponent or other low molecular weight component, which mostinternally-crosslinked ultraviolet curable adhesives do not contain, andthey can form an adhesive layer that has a stable layer structure, wherean oligomer component or other low molecular weight component does notmigrate in the adhesive over time.

The above-mentioned base polymer, which has a carbon-carbon double bond,may be any polymer that has a carbon-carbon double bond and further isviscous. For such a base polymer, a polymer having an acrylic polymer asa basic skeleton is preferable. Examples of the basic skeleton of theacrylic polymer include the acrylic polymers exemplified above.

The method for introducing a carbon-carbon double bond into any one ofthe above-mentioned acrylic polymers is not particularly limited, andmay be selected from various methods. The introduction of thecarbon-carbon double bond into a side chain of the polymer is easier inmolecule design. The method is, for example, a method of copolymerizinga monomer having a functional group with an acrylic polymer, and thencausing the resultant product to undergo a condensation or additionreaction with a compound having a functional group reactive with theabove-mentioned functional group and a carbon-carbon double bond, whilepreserving the ultraviolet ray curability of the carbon-carbon doublebond.

Example combinations of these functional groups include a carboxylicacid group and an epoxy group; a carboxylic acid group and an aziridinegroup; and a hydroxyl group and an isocyanate group. Of thesecombinations, the combination of a hydroxyl group and an isocyanategroup is preferable for monitoring the extent of the reaction. If theabove-mentioned acrylic polymer, which has a carbon-carbon double bond,can be produced by the combination of these functional groups, each ofthe functional groups may be present on any one of the acrylic polymerand the above-mentioned compound. It is preferable, for the case of theabove-mentioned preferred combination, that the acrylic polymer has thehydroxyl group and the above-mentioned compound has the isocyanategroup. Examples of the isocyanate compound in this case, which has acarbon-carbon double bond, include methacryloyl isocyanate,2-methacryloyloxyethyl isocyanate, and m-isopropenyl-α,α-dimethylbenzylisocyanate. The acrylic polymer may be an acrylic polymer copolymerizedwith any one of the hydroxyl-containing monomers exemplified above, oran ether compound such as 2-hydroxyethyl vinyl ether, 4-hydroxybutylvinyl ether or diethylene glycol monovinyl ether.

The intrinsic type (i.e., self cross-linking) ultraviolet-ray curableadhesive may be made only of the above-mentioned base polymer (inparticular, the acrylic polymer), which has a carbon-carbon double bond.However, the above-mentioned ultraviolet ray curable monomer componentor oligomer component may be incorporated into the base polymer to suchan extent that properties of the adhesive are not deteriorated. Theamount of the ultraviolet ray curable oligomer component or the like isusually 30 parts or less by weight, preferably from 0 to 10 parts byweight for 100 parts by weight of the base polymer.

In the case that the ultraviolet-ray curable adhesive is cured withultraviolet rays or the like, a photopolymerization initiator isincorporated into the adhesive. Examples of the photopolymerizationinitiator include α-ketol compounds such as4-(2-hydroxyethoxy)phenyl(2-hydroxy-2-propyl)ketone,α-hydroxy-α,α′-dimethylacetophenone, 2-methyl-2-hydroxypropiophenone,and 1-hydroxycyclohexyl phenyl ketone; acetophenone compounds such asmethoxyacetophenone, 2,2-dimethoxy-2-phenylacetophenone,2,2-diethoxyacetophenone, and2-methyl-1-[4-(methylthio)-phenyl]-2-morpholinopropane-1; benzoin ethercompounds such as benzoin ethyl ether, benzoin isopropyl ether, andanisoin methyl ether; ketal compounds such as benzyl dimethyl ketal;aromatic sulfonyl chloride compounds such as 2-naphthalenesulfonylchloride; optically active oxime compounds such as1-phenone-1,1-propanedione-2-(o-ethoxycarbonyl)oxime; benzophenonecompounds such as benzophenone, benzoylbenzoic acid, and3,3′-dimethyl-4-methoxybenzophenone; thioxanthone compound such asthioxanthone, 2-chlorothioxanthone, 2-methylthioxanthone,2,4-dimethylthioxanthone, isopropylthioxanthone,2,4-dichlorothioxanthone, 2,4-diethylthioxanthone, and2,4-diisopropylthioxanthone; camphorquinone; halogenated ketones;acylphosphonoxides; and acylphosphonates. The amount of thephotopolymerization initiator to be blended is, for example, from about0.05 to 20 parts by weight for 100 parts by weight of the acrylicpolymer or the like which constitutes the adhesive as a base polymer.

When the adhesive layer 14 is formed with an ultraviolet-ray curableadhesive, the layer may be irradiated with an ultraviolet ray in advanceto adjust the shear modulus and the melt viscosity. In this case, anexample of the ultraviolet-ray intensity is 10 to 1000 mJ/cm².

When curing inhibition due to oxygen occurs during irradiation with anultraviolet ray, it is desirable to block oxygen (air) from the surfaceof the adhesive layer 14 by some method. Examples thereof include amethod of performing irradiation with an ultraviolet ray in a nitrogengas atmosphere.

The thickness of the adhesive layer 14 is not especially limited.However, it is preferably 0.1 times or more and 1.2 times or less theheight of the bump and more preferably 0.5 times or more and 1.2 timesor less the height of the bump in order to more certainly expose thebumps. The specific thickness of the adhesive layer 14 is preferably 5to 300 μm and more preferably 5 to 200 μm, for example.

The total of the thickness of the support base 12 and the thickness ofthe adhesive layer 14 is preferably 20 to 500 μm and more preferably 40to 200 μm to achieve the desired peeling property.

Support Base

The support base 12 is not especially limited, and a plastic base suchas a plastic film or sheet can be suitably used, for example. Examplesof such a plastic material include olefin resins such as polyethylene(PE), polypropylene (PP), and an ethylene-propylene copolymer;copolymers having ethylene as a monomer component such as anethylene-vinyl acetate copolymer (EVA), an ionomer resin, anethylene-(meth)acrylic acid copolymer, and an ethylene-(meth)acrylate(random or alternating) copolymer; polyesters such as polyethyleneterephthalate (PET), polyethylene naphthalate (PEN), and polybutyleneterephthalate (PBT); acrylic resins; polyvinyl chloride (PVC);polyurethane; polycarbonate; polyphenylene sulfide (PPS); amide resinssuch as polyamide (nylon) and wholly aromatic polyamide (aramid);polyetheretherketone (PEEK); polyimide; polyetherimide; polyvinylidenechloride; ABS (acrylonitrile-butadiene-styrene copolymer); celluloseresins; silicone resins; and fluorine resins.

An example of the material of the support base 12 is a polymer such as acrosslinked body of the above-described resins. The above-describedplastic film may be unstretched or may be uniaxially stretched orbiaxially stretched as necessary. With the resin sheet having a heatshrinking property given by a stretching treatment or the like, theadhesion area of the adhesive layer 14 with the thermosetting resinlayer 16 is decreased by heat-shrinking the support base 12 after thefilm 10 for forming a protective layer is pasted onto the bumped wafer3, and the support base 12 and the adhesive layer 14 can then be easilypeeled from the thermosetting resin layer 16.

The surface of the support base 12 can be subjected to a common surfacetreatment such as a chemical or physical treatment such as a chromicacid treatment, ozone exposure, flame exposure, high voltage shockexposure, or an ionizing radiation treatment, or a coating treatment bya primer (for example, an adhesive material described later) to enhanceadhesion with the adjacent layer, the bonding property, and the like.

The same type or different types of the plastic materials can beappropriately selected and used as the support base 12, and severalkinds of plastic materials can be blended and used as necessary. Avapor-deposited layer of a conductive substance made of metals, alloys,oxides of these, or the like and having a thickness of about 30 to 500 Åcan be formed on the support base 12 to give an antistatic function. Thesupport base 12 may be a single layer or may be a plurality of layers oftwo kinds or more.

The thickness of the support base 12 (the total thickness in case of alaminated body) is not especially limited, and it can be appropriatelyselected according to strength, flexibility, application purpose, andthe like. It is preferably 10 to 500 μm and more preferably 20 to 200μm.

Various additives such as a coloring agent, a filler, a plasticizer, ananti-aging agent, an antioxidant, a surfactant, and a flame retardantmay be included in the support base 12 as long as the effect of thepresent invention is not damaged.

Method of Manufacturing Film for Forming Protective Layer

The method of manufacturing the film 10 for forming a protective layeraccording to the present embodiment is explained. First, the supportbase 12 can be formed by a conventionally known film forming method.Examples of the film forming method include a calendering method, acasting method in an organic solvent, an inflation extrusion method in aclosed system, a T-die extrusion method, a co-extrusion method, and adry lamination method.

Next, the adhesive layer 14 is formed by applying an adhesivecomposition onto the support base 12 and drying (heating andcrosslinking as necessary) the composition. Examples of the applicationmethod include roll coating, screen coating, and gravure coating. Theadhesive layer 14 may be formed on the support base 12 by directlyapplying the adhesive composition onto the support base 12, or theadhesive layer 14 may be formed by applying the adhesive compositiononto release paper whose surface has been subjected to a peelingtreatment, and then the adhesive layer 14 may be transferred to thesupport base 12. The adhesive layer 14 is irradiated with an ultravioletray to adjust the shear modulus and the melt viscosity of the adhesivelayer 14 as necessary.

On the other hand, a coating layer is formed by applying a material forforming the thermosetting resin layer 16 onto release paper so that thethickness of the layer after drying becomes a prescribed thickness, anddrying the material under a prescribed condition (performing a heatingtreatment for drying as necessary when heat curing is necessary). Thethermosetting resin layer 16 is formed on the adhesive layer 14 bytransferring this coating layer onto the adhesive layer 14. Thethermosetting resin layer 16 can be formed on the adhesive layer 14 alsoby applying a material for forming the thermosetting resin layer 16directly onto the adhesive layer 14 and drying the material under aprescribed condition (performing a heating treatment for drying asnecessary when heat curing is necessary). With this operation, the filmfor forming a protective layer can be obtained.

Method of Manufacturing Semiconductor Device

In the following, the method of manufacturing a semiconductor deviceaccording to the present embodiment is explained by referring to FIGS. 3to 6. FIGS. 3 to 6 are sectional views schematically showing one exampleof the method of manufacturing a semiconductor device according to thepresent embodiment.

The method of manufacturing a semiconductor device according to thepresent embodiment has at least the steps of pasting the film 10 forforming a protective layer onto the bumped wafer 3 with thethermosetting resin layer 16 being a pasting surface, peeling thesupport base 12 and the adhesive layer 14 from the thermosetting resinlayer 16, forming the protective layer 17 by thermally curing thethermosetting resin layer 16, and dicing the bumped wafer 3 and theprotective layer 17 together.

First, as shown in FIG. 3, the film 10 for forming a protective layer ispasted onto the bumped wafer 3 with the thermosetting resin layer 16being a pasting surface. The pasting method is not especially limited.However, a pressure-bonding method is preferable. Pressure-bonding isnormally performed by pressing the laminate with a pressing means suchas a pressure roll. As a pressure-bonding condition, thepressure-bonding temperature is preferably to 150° C. and morepreferably 30 to 100° C. The linear pressure is preferably 0.05 to 1.0MPa and more preferably 0.2 to 1.0 MPa. The pressure-bonding speed ispreferably 1 to 100 mm/sec and more preferably 10 to 80 mm/sec. Withthis operation, the bumps 51 of the bumped wafer 3 protrude from thethermosetting resin layer 16.

Next, backside grinding of the bumped wafer 3 is performed as necessary.Because the film 10 for forming a protective layer is pasted onto thesurface where the bumps 51 of the bumped wafer 3 are formed, the bumpedwafer 3 can be held and fixed by the film 10 for forming a protectivelayer. The backside of the bumped wafer 3 is the surface where the bumps51 of the bumped wafer 3 are not formed.

Next, a dicing tape (not shown in the drawings) is pasted onto thebackside of the bumped wafer 3. A conventionally known dicing tape canbe used, and also a conventionally known pasting apparatus can be used.

Then, the support base 12 and the adhesive layer 14 are peeled from thethermosetting resin layer 16. When the adhesive layer 14 is made of anultraviolet-ray curable resin, it is irradiated with an ultraviolet rayfrom the support base 12 side as necessary. With this operation, theadhesive layer 14 is cured, and the peel strength of the interfacebetween the adhesive layer 14 and the thermosetting resin layer 16decreases.

For example, a back grinding tape peeling apparatus MA-3000IImanufactured by Nitto Seiki Co., Ltd. can be used for peeling. The peelstrength of the thermosetting resin layer 16 (before thermal curing)from the adhesive layer 14 is preferably 5 N/20 mm or less (for example,0.01 N/20 mm to 5 N/20 mm) and more preferably 0.01 N/20 mm to 1 N/20mm. By making the peel strength of the thermosetting resin layer 16(before thermal curing) from the adhesive layer 14 within theabove-described numerical range, the thermosetting resin layer 16(before thermal curing) can be favorably peeled from the adhesive layer14. The value of the peel strength is a value measured by a T-typepeeling test (JIS K6854-3) performed at a temperature of 23±2° C., apeeling angle of 180°, a peeling speed of 300 mm/min, and a distancebetween chucks of 100 mm. An Autograph AGS-H (trade name) manufacturedby Shimadzu Corporation is used as a tensile tester.

Next, the protective layer 17 is formed by thermally curing thethermosetting resin layer 16 (see FIG. 4). As a heating condition, theheating temperature is preferably 120 to 200° C. and more preferably 140to 180° C. The heating time is preferably 30 minutes to 3 hours and morepreferably 1 to 2 hours.

Then, the bumped wafer 3 is diced together with the protective layer 17by a dicing blade 22 (see FIG. 5). For dicing, a conventionally knowndicing apparatus having a dicing blade can be used, for example. Becausethe low dielectric material layer 41 of the bumped wafer 3 is diced in astate where it is reinforced with the protective layer 17, thegeneration of cracks in the low dielectric material layer 41 can besuppressed. Because the low dielectric material layer 41 is diced in astate where it is reinforced with the protective layer 17, the lowdielectric material layer 41 does not have to be removed in advance bylaser scribing or the like. As a result, an increase in the number ofprocessing steps can be suppressed. However, in the present invention,the low dielectric material layer on a dicing street is preferablyremoved in advance by laser scribing or the like before dicing (forexample, before pasting the bumped wafer to the film for forming aprotective layer). This procedure is preferable in that cracks in thelow dielectric material layer can more certainly be suppressed.

After that, as shown in FIG. 6, a semiconductor chip 5 individualized bydicing is picked up, and adhered and fixed to an adherend 6. Because thebumps 51 on the semiconductor chip 5 protrude from the protective layer17, they can be electrically connected to the conductive material 61 onthe adherend 6. Specifically, the semiconductor chip 5 is fixed to theadherend 6 by a conventional method in a state where the bumped surfaceof the semiconductor chip 5 faces the adherend 6. For example, thesemiconductor chip 5 can be fixed to the adherend 6, thereby securingthe electrical conduction of the semiconductor chip 5 with the adherend6, by melting a conductive material 61 such as solder while contactingand pressing the bumped surface of the semiconductor chip 5 to theconductive material adhered to a connection pad of the adherend 6. Atthis time, a space is formed between the semiconductor chip 5 and theadherend 6, and the distance of the space is generally about 30 to 300μm. After the semiconductor chip 5 is adhered onto the adherend 6, thesurface of the semiconductor chip 5 facing the adherend 6 and the spacetherebetween are washed, and the space is filled and sealed with asealing material such as a sealing resin.

Various substrates such as a lead frame and a circuit board (wiringcircuit board, or the like) can be used as the adherend 6. The materialof the substrate is not especially limited, and examples thereof includea ceramic substrate and a plastic substrate. Examples of the plasticsubstrate include an epoxy substrate, a bismaleimide triazine substrate,and a polyimide substrate.

The material of the bump and the conductive material is not especiallylimited, and examples thereof include solder (alloys) of a tin-leadmetal material, a tin-silver metal material, a tin-silver-copper metalmaterial, a tin-zinc metal material, and a tin-zinc-bismuth metalmaterial, a gold metal material, and a copper metal material.

In this step, it is preferable to wash the opposing surface (electrodeforming surface) between the semiconductor chip 5 and the adherend 6 andthe space therebetween. The washing liquid used for washing is notespecially limited, and examples thereof include an organic washingliquid and an aqueous washing liquid.

Next, a sealing step is performed for sealing the space between thesemiconductor chip 5 and the adherend 6. The sealing step is performedusing a sealing resin. The sealing condition is not especially limited.Normally, thermal curing of the sealing resin is performed by heating at175° C. for 60 to 90 seconds. However, the present invention is notlimited to this operation, and the resin can be cured at 165 to 185° C.for a few minutes.

The sealing resin should be understood not to be particularly limited,and may be a resin having an insulating property (referred to as an“insulating resin”). Accordingly, sealing materials such as knownsealing resins can be appropriately selected and used. However, aninsulating resin having substantial elasticity is more preferable.Examples of the sealing resin include a resin composition containing anepoxy resin. The epoxy resins exemplified above can be used. In theepoxy-containing sealing resin, a thermosetting resin other than theepoxy resin such as a phenol resin, a thermoplastic resin, or the likemay be contained as a resin component besides the epoxy resin. Thephenol resin can be used as a curing agent for the epoxy resin, andexamples of the phenol resin include the phenol resins exemplifiedabove.

Below, preferred examples of the present invention are explained indetail. However, materials, addition amounts, and the like described inthese examples are not intended to limit the scope of the presentinvention, and shall be understood merely to be illustrative examplesfor the purposes of explanation, and any limitations specificallydescribed below shall be understood as example limitations.

<Preparation of Support Base>

A polyethylene terephthalate film (PET film) having a thickness of 50 μmand an ethylene vinyl acetate copolymer film (EVA film) having athickness of 120 μm were prepared.

<Production of Adhesive Layer>

In Examples 1 to 9 and Comparative Examples 1 and 2, an adhesive layerwas obtained by applying the following adhesive composition solution Aonto the prepared support base and drying the solution. The thickness ofthe produced adhesive layer is as shown in Tables 1 and 2.

Adhesive Composition Solution A

86.4 parts of 2-ethylhexyl acrylate (hereinafter, also referred to as“2EHA”), 13.6 parts of 2-hydroxyethyl acrylate (hereinafter, alsoreferred to as “HEA”), 0.2 parts of benzoyl peroxide, and 65 parts oftoluene were charged into a reactor with a cooling tube, a nitrogenintroducing tube, a thermometer, and a stirrer, and then polymerized at61° C. in a nitrogen gas stream for 6 hours to give an acrylic polymerA.

An acrylic polymer A′ was obtained by adding 14.6 parts of2-methacryloyloxyethyl isocyanate (hereinafter, also referred to as“MOI”) to the acrylic polymer A, and performing an addition reaction at50° C. in an air stream for 48 hours.

Next, an adhesive composition solution A was obtained by adding 8 partsof a polyisocyanate compound (trade name: Coronate L manufactured byNippon Polyurethane Industry Co., Ltd.) and 5 parts of aphotopolymerization initiator (trade name: Irgacure 651 manufactured byCiba Specialty Chemicals Inc.) into 100 parts of the acrylic polymer A′.

<Production of Thermosetting Resin Layer>

Thermosetting Resin Layer a

31.6 parts of a naphthalene type epoxy resin having an epoxy equivalentof 142 g/eq (trade name: HP4032D manufactured by DIC Co., Ltd.), 7.9parts of a trisphenol meta type epoxy resin having an epoxy equivalentof 169 g/eq (trade name: EPPN501HY manufactured by Nippon Kayaku Co.,Ltd.), 47.3 parts of an aralkyl type phenol resin having a phenolequivalent of 175 g/eq (trade name: MEHC7800S manufactured by MeiwaPlastic Industries, Ltd.), 12 parts of a butylacrylate-acrylonitrile-glycidyl methacrylate copolymer (trade name:SG-28GM manufactured by Nagase ChemteX Corporation), and 1.2 parts oftriphenylphosphine as a curing catalyst were dissolved inmethylethylketone to prepare a solution of the adhesive compositionhaving a solid concentration of 38.6% by weight.

A thermosetting resin layer a having the thickness shown in Tables 1 and2 was produced by applying this solution of the adhesive compositiononto a release film made of a polyethylene terephthalate film having athickness of 50 μm, which had been subjected to a silicone releasetreatment as a release liner (separator), and drying the solution at130° C. for 2 minutes.

Thermosetting Resin Layer b

38.1 parts of a trisphenol meta type epoxy resin having an epoxyequivalent of 169 g/eq (trade name: EPPN501HY manufactured by NipponKayaku Co., Ltd.), 40.8 parts of an aralkyl type phenol resin having aphenol equivalent of 175 g/eq (trade name: MEHC7800S manufactured byMeiwa Plastic Industries, Ltd.), 20 parts of a butylacrylate-acrylonitrile-ethyl methacrylate copolymer (trade name: SG-P3manufactured by Nagase ChemteX Corporation), and 1.2 parts oftriphenylphosphine as a curing catalyst were dissolved inmethylethylketone to prepare a solution of the adhesive compositionhaving a solid concentration of 48.0% by weight.

A thermosetting resin layer b having the thickness shown in Tables 1 and2 was produced by applying this solution of adhesive composition onto arelease film made of a polyethylene terephthalate film having athickness of 50 μm which had been subjected to a silicone releasetreatment as a release liner (separator), and drying the solution at130° C. for 2 minutes.

Thermosetting Resin Layer c

34.4 parts of a bisphenol A type epoxy resin having an epoxy equivalentof 185 g/eq (trade name: YL-980 manufactured by Japan Epoxy Resin Co.,Ltd.), 14.8 parts of a trisphenol meta type epoxy resin having an epoxyequivalent of 169 g/eq (trade name: EPPN501HY manufactured by NipponKayaku Co., Ltd.), 22.6 parts of an aralkyl type phenol resin having aphenol equivalent of 175 g/eq (trade name: MEHC7800S manufactured byMeiwa Plastic Industries, Ltd.), 15.1 parts of a phenol novolac resinhaving a phenol equivalent of 105 g/eq (trade name: GS-180 manufacturedby Gun Ei Chemical Industry Co., Ltd.), 12 parts of a butylacrylate-acrylonitrile-ethyl methacrylate copolymer (trade name: SG-P3manufactured by Nagase ChemteX Corporation), and 1.2 parts oftriphenylphosphine as a curing catalyst were dissolved inmethylethylketone to prepare a solution of the adhesive compositionhaving a solid concentration of 54.4% by weight.

A thermosetting resin layer c having the thickness shown in Tables 1 and2 was produced by applying this solution of adhesive composition onto arelease film made of a polyethylene terephthalate film having athickness of 50 μm, which had been subjected to a silicone releasetreatment as a release liner (separator) and drying the solution at 130°C. for 2 minutes.

<Production of Film for Forming Protective Layer>

In Examples 1 to 9 and Comparative Examples 1 and 2, a film for forminga protective layer was produced by pasting each of the thermosettingresin layers produced as described above onto the adhesive layerproduced as described above. In Comparative Examples 3 and 4, a film forforming a protective layer was produced by pasting each of thethermosetting resin layers produced as described above onto the preparedsupport base. Combinations of the support base, adhesive layer, andthermosetting resin layer of the films for forming a protective layeraccording to examples and comparative examples are shown in Tables 1 and2.

The conditions of the lamination step are as follows.

<Laminator Condition>

Laminator roll laminator

Laminating speed: 1 mm/min

Laminating pressure: 0.5 MPa

Laminator temperature: room temperature (23° C.)

Measurement of Shear Modulus of Adhesive Layer

The shear modulus of the adhesive layer (in Examples 3 to 9 andComparative Examples 1 and 2, the adhesive layer after irradiation withan ultraviolet ray shown in Tables 1 and 2) was measured. The shearmodulus was measured by forming an adhesive layer (thickness 0.2 mm)using the prepared adhesive composition solution A using a shear modulusmeasurement apparatus (ARES manufactured by Rheometric Scientific FE,Ltd.) Specifically, the shear modulus of the sample was measured at the“pasting temperature” shown in Tables 1 and 2 under a condition of afrequency of 1 Hz, a plate diameter of 7.9 mm φ, and a strain of 1%. Theresults are shown in Tables 1 and 2.

Measurement of Melt Viscosity

The melt viscosity of the thermosetting resin layer (before thermalcuring) was measured. The melt viscosity is measured by a parallel platemethod using a rheometer (RS-1 manufactured by Haake GmbH). In moredetail, the measurement is performed using a gap of 100 μm, a rotatingcone diameter of 20 mm, and a rotational speed of 10 s⁻¹ at atemperature in the range of room temperature to 250° C. The meltviscosity at the “pasting temperature” shown in Tables 1 and 2 wasregarded as the measured value. The results are shown in Tables 1 and 2.Peel strength of adhesive layer and thermosetting resin layer andpeeling property at the interface between adhesive layer andthermosetting resin layer

Each of the films for forming a protective layer in the Examples andComparative Examples were pasted onto the surface of a bumped siliconwafer where bumps were formed with the thermosetting resin layer as thepasting surface. The following wafer was used as the bumped siliconwafer. The pasting conditions were as follows.

<Bumped Silicon Wafer>

Thickness of silicon wafer: 200 μm

Material of low dielectric material layer: SiN film

Thickness of low dielectric material layer: 0.3 μm

Height of bump: 65 μm

Pitch of bump: 150 μm

Material of bump: solder

<Pasting Condition>

Pasting apparatus: DR-3000II manufactured by Nitto Seiki Co., Ltd.

Laminating speed: 0.1 mm/min

Laminating pressure: 0.5 MPa

Laminator temperature: set at the “pasting temperature” in Tables 1 and2

Then, the peel strength of the adhesive layer from the thermosettingresin layer was measured. Specifically, a T-type peeling test (JISK6854-3) as a tensile test was performed at a temperature of 23±2° C., apeeling angle of 180°, a peeling speed of 300 mm/min, and a distancebetween chucks of 100 mm using an Autograph AGS-H (trade name)manufactured by Shimadzu Corporation. The results are shown in Tables 1and 2. The adhesive layer was cured in Examples 1 and 2 by irradiationwith an ultraviolet ray from the support base side. For ultravioletirradiation, an ultraviolet ray irradiation apparatus (trade name: UM810manufactured by Nitto Seiki Co., Ltd.) was used and the ultraviolet rayirradiation intensity was set to 400 mJ/cm². After that, the peelstrength of the adhesive layer on the thermosetting resin layer wasmeasured. The results are shown in Tables 1 and 2 as “peel strength ofadhesive layer on thermosetting resin layer before peeling and afterirradiation with ultraviolet ray.”

The ability to peel the adhesive layer with a support base from theprotective layer (thermosetting resin layer) was evaluated. Theevaluation results are shown in Tables 1 and 2, by marking cases wherethe adhesive layer was peeled from the thermosetting resin layer at theinterface as ∘ and marking cases where it was not peeled as x.

Whether the Tip of Bump is Exposed or not

The evaluation was performed by observing the surface of thesemiconductor wafer side of the sample used in the peeling test. Theresults are shown in Tables 1 and 2, by marking cases where the tip ofthe bump was exposed as ∘ and cases where it is not exposed as x.

Dicing Property

After observation of the exposure of the tip of the bump, a protectivelayer was formed by curing the thermosetting resin layer by heating at175° C. for 2 hours. After that, dicing of the bumped silicon wafer wasperformed. The bumped silicon wafer was diced together with theprotective layer using DU-300 manufactured by Nitto Denko Corporation asthe dicing tape and DFD6361 (trade name) manufactured by DISCOCorporation as the dicing apparatus. The evaluation was performed bymarking cases where the dicing was successful, where there was nopeeling or chipping of the low dielectric material layer, as ∘, and bymarking cases where there was even a little peeling or chipping of thelow dielectric material layer, as x. The results are shown in Tables 1and 2. However, evaluation of the dicing property was not performed inComparative Examples 1 and 3 because the tip of the bump could not beexposed. Evaluation of the dicing property was not performed inComparative Example 4 because the support base could not be peeled fromthe protective layer (the thermosetting resin layer).

<Dicing Condition>

Dicing size: 10 mm×10 mm

Dicing speed: 30 mm/sec

Spindle rotating speed: 40000 rpm

TABLE 1 EXAM- EXAM- EXAM- EXAM- EXAM- EXAM- EXAM- EXAM- EXAM- PLE 1 PLE2 PLE 3 PLE 4 PLE 5 PLE 6 PLE 7 PLE 8 PLE 9 PASTING TEMPERATURE (° C.)75 75 75 75 100  65 75 75 50 SUPPORT MATERIAL PET PET PET PET PET PETPET PET PET BASE THICKNESS (μm) 50 50 50 50 50 50 50 50 50 ADHESIVE TYPEOF SOLUTION A A A A A A A A A LAYER THICKNESS 30 60 30 60 30 30 30 30 30ULTRAVIOLET RAY  0  0 400  400  400  400  400  400  400  IRRADIATIONINTENSITY (mJ/cm²) SHEAR MODULUS 3.8 × 10⁴ 3.8 × 10⁴ 5.7 × 10⁵ 5.7 × 10⁵4.5 × 10⁴ 2.9 × 10⁵ 5.7 × 10⁵ 5.7 × 10⁵ 1.2 × 10⁶ (Pa) AT PASTINGTEMPERATURE THERMO- TYPE OF SOLUTION a a a a a a a a a SETTING THICKNESS(μm) 40 40 40 40 40 40 60  5 40 RESIN MELT VISCOSITY 1.5 × 10³ 1.5 × 10³1.5 × 10³ 1.5 × 10³ 4.5 × 10² 1.2 × 10⁴ 1.5 × 10³ 1.5 × 10³ 1.7 × 10⁴LAYER (Pa · S) AT PASTING TEMPERATURE INITIAL PEEL STRENGTH >2 >2   0.04    0.03    0.04    0.04    0.04    0.04    0.04 (N/20 mm) OFADHESIVE LAYER ON THERMOSETTING RESIN LAYER IRRADIATION WITH ULTRAVIOLETYES YES NO NO NO NO NO NO NO RAY BEFORE PEELING PEEL STRENGTH (N/20 mm)OF    0.04    0.04 — — — — — — — ADHESIVE LAYER ON THERMOSETTING RESINLAYER BEFORE PEELING AND AFTER IRRADIATION WITH ULTRAVIOLET BAY PEELINGPROPERTY ◯ ◯ ◯ ◯ ◯ ◯ ◯ ◯ ◯ WHETHER TIP OF BUMP IS ◯ ◯ ◯ ◯ ◯ ◯ ◯ ◯ ◯EXPOSED OR NOT THICKNESS RATIO (THICKNESS 40/65 40/65 40/65 40/65 40/6540/65 60/65 5/65 5/65 OF THERMOSETTING RESIN LAYER/BUMP HEIGHT) DICINGPROPERTY ◯ ◯ ◯ ◯ ◯ ◯ ◯ ◯ ◯

TABLE 2 COMPARATIVE COMPARATIVE COMPARATIVE COMPARATIVE EXAMPLE 1EXAMPLE 2 EXAMPLE 3 EXAMPLE 4 PASTING TEMPERATURE (° C.) 65 100 75 75SUPPORT BASE MATERIAL PET PET PET EVA THICKNESS (μm) 50 50 50 120ADHESIVE LAYER TYPE OF SOLUTION A A — — THICKNESS 30 30 — — ULTRAVIOLETRAY 400 400 — — IRRADIATION INTENSITY (mJ/cm²) SHEAR MODULUS (Pa) AT 2.9× 10⁵ 4.5 × 10⁴ — — PASTING TEMPERATURE THERMOSETTING TYPE OF SOLUTION bC a a RESIN LAYER THICKNESS (μm) 40 40 40 40 MELT VISCOSITY (Pa · S) AT1.6 × 10⁵ 8.9 × 10¹ 1.5 × 10³ 1.5 × 10³ PASTING TEMPERATURE INITIAL PEELSTRENGTH (N/20 mm) OF 0.04 0.04 — — ADHESIVE LAYER FROM THERMOSETTINGRESIN LAYER IRRADIATION WITH ULTRAVIOLET RAY BEFORE NO NO — — PEELINGPEEL STRENGTH (N/20 mm) OF ADHESIVE LAYER — — — — FROM THERMOSETTINGRESIN LAYER BEFORE PEELING AND AFTER IRRADIATION WITH ULTRAVIOLET RAYPEELING PROPERTY ◯ ◯ ◯ X WHETHER TIP OF BUMP IS EXPOSED OR NOT X X X ◯THICKNESS RATIO 40/65 40/65 40/65 40/65 (THICKNESS OF THERMOSETTINGRESIN LAYER/ BUMP HEIGHT) DICING PROPERTY — ◯ — —(Results)

In the films for forming a protective layer of Examples 1 to 9, the bumpcould protrude from the thermosetting resin layer. On the other hand,the tip of the bump was not exposed in Comparative Example 1 because themelt viscosity of the thermosetting resin layer at the pastingtemperature was as high as 1.6×10⁵ Pa·S. In Comparative Example 2, theresin that constitutes the thermosetting resin layer was washed awayupon pasting and the protective layer could not be formed because themelt viscosity of the thermosetting resin layer at the pastingtemperature was as low as 8.9×10⁵ Pa·S. In Comparative Example 3, thebump contacted a hard PET film of the support base and the tip of thebump was not exposed because no adhesive layer existed. In ComparativeExample 4, although the tip of the bump could be exposed by embeddingthe bump into a soft EVA film of the support base because no adhesivelayer existed, the thermosetting resin layer could not be peeled fromthe support base.

What is claimed is:
 1. A method of manufacturing a semiconductor device,using a film for forming a protective layer on a bumped wafer in which alow dielectric material layer is formed, the film for forming theprotective layer comprising a support base, an adhesive layer, and athermosetting resin layer, laminated in this order, wherein a meltviscosity of the thermosetting resin layer is 1×10² Pa·S or more and2×10⁴ Pa·S or less, and a shear modulus of the adhesive layer is 1×10³Pa or more and 2×10⁶ Pa or less when a temperature of the thermosettingresin layer is in a range of 50 to 120° C., comprising the steps of:pasting the film for forming the protective layer onto the bumped waferin which the low dielectric material layer is formed with thethermosetting resin layer serving as a pasting surface; peeling thesupport base and the adhesive layer from the thermosetting resin layer;forming the protective layer by thermally curing the thermosetting resinlayer; dicing the bumped water and the protective layer together;picking up a semiconductor chip individualized by dicing; and adheringand fixing the semiconductor chip to an adherend; wherein a thickness ofthe thermosetting resin layer before being cured to form the protectivelayer is 0.05 times or more and 0.9 times or less a bump height of thebumped wafer, wherein the bump height is a distance from a first end ofa bump of a plurality of bumps in the low dielectric material layer to asecond end opposite the first end, and the bumps protrude from opposingends of the thermosetting resin layer.
 2. The method of manufacturing asemiconductor device according to claim 1, wherein a thickness of thethermosetting resin layer is 5 μm or more and 200 μm or less.
 3. Themethod of manufacturing a semiconductor device according to claim 1,wherein the thermosetting resin layer contains an epoxy resin and aphenol resin, and the adhesive layer contains an acrylic polymer.
 4. Themethod of manufacturing a semiconductor device according to claim 2,wherein the thermosetting resin layer contains an epoxy resin and aphenol resin, and the adhesive layer contains an acrylic polymer.